References

 
 

• IBM Corporation, Global Research (Yorktown Heights, USA)
• University of Copenhagen, Department of Chemistry (Copenhagen, Denmark).
• JEOL Ltd. (Akishima, Japan)
• University of Tokyo, Department of Physics (Tokyo, Japan)
• Headway Technologies (Milpitas, USA) 
• Canon-ANELVA Corporation (Tokyo, Japan) 
• Hitachi Global Storage Technologies (San José, USA)
• TDK Corporation (Nagano. USA)
• NEC Toshiba (Sagamihara, Japan)
• Fujitsu Laboratories (Atsugi, Japan)
• Hitachi GST (Odawara, Japan)
• Applied Materials (Sunnyvale, USA)
• ALPS (Nagaoka, Japan)
• Toshiba (Kawasaki, Japan)
• NIST - National Institute of Standards and Technology (Gaithersburg, USA)
• AIST - National Institute of Advanced Industrial Science and Technology (Tsukuba, Japan)
• Grandis, Inc. (Milpitas, USA)
• Crocus Technology (Grenoble, France)
• IMEC vzw (Leuven, belgium)
• Singulus Nano Deposition Technologies GmbH (Kahl am Main, Germany)
• Max-Planck-Institut für Microstructurphysik (Halle, Germany)
• IFW Dresden (Germany)